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Tribromosilane

Tribromosilane is the chemical compound with the formula HBr3Si.[1] At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.

Tribromosilane
Names
IUPAC name
Tribromosilane
Other names
Silicobromoform; Tribromomonosilane
Identifiers
  • 7789-57-3 Y
3D model (JSmol)
  • Interactive image
ChemSpider
  • 74222
ECHA InfoCard 100.029.250
  • 82244
UNII
  • H5DT3G5DA3 Y
  • DTXSID50160668
  • InChI=1S/Br3HSi/c1-4(2)3/h4H
  • Br[SiH](Br)Br
Properties
Br3HSi
Molar mass 268.805 g·mol−1
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).

The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.[2]

It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature.[3] It spontaneously combusts when exposed to air.[4]

References edit

  1. ^ PubChem. "Tribromosilane". pubchem.ncbi.nlm.nih.gov. Retrieved 2022-12-22.
  2. ^ The Schumacher Process
  3. ^ Schumb WC, Young RC (April 1930). "A study of the reaction of hydrogen bromide with silicon". Journal of the American Chemical Society. 52 (4): 1464–1469. doi:10.1021/ja01367a025.
  4. ^ Schumb WC (December 1942). "The Halides and Oxyhalides of Silicon". Chemical Reviews. 31 (3): 587–595. doi:10.1021/cr60100a004.

tribromosilane, chemical, compound, with, formula, hbr3si, high, temperatures, decomposes, produce, silicon, alternative, purified, trichlorosilane, ultrapure, silicon, semiconductor, industry, namesiupac, name, other, names, silicobromoform, tribromomonosilan. Tribromosilane is the chemical compound with the formula HBr3Si 1 At high temperatures it decomposes to produce silicon and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry Tribromosilane NamesIUPAC name TribromosilaneOther names Silicobromoform TribromomonosilaneIdentifiersCAS Number 7789 57 3 Y3D model JSmol Interactive imageChemSpider 74222ECHA InfoCard 100 029 250PubChem CID 82244UNII H5DT3G5DA3 YCompTox Dashboard EPA DTXSID50160668InChI InChI 1S Br3HSi c1 4 2 3 h4HSMILES Br SiH Br BrPropertiesChemical formula Br 3H SiMolar mass 268 805 g mol 1Except where otherwise noted data are given for materials in their standard state at 25 C 77 F 100 kPa Infobox references The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon but it has a number of cost and safety advantages over the Siemens Process to make polysilicon 2 It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature 3 It spontaneously combusts when exposed to air 4 References edit PubChem Tribromosilane pubchem ncbi nlm nih gov Retrieved 2022 12 22 The Schumacher Process Schumb WC Young RC April 1930 A study of the reaction of hydrogen bromide with silicon Journal of the American Chemical Society 52 4 1464 1469 doi 10 1021 ja01367a025 Schumb WC December 1942 The Halides and Oxyhalides of Silicon Chemical Reviews 31 3 587 595 doi 10 1021 cr60100a004 nbsp This inorganic compound related article is a stub You can help Wikipedia by expanding it vte Retrieved from https en wikipedia org w index php title Tribromosilane amp oldid 1199272461, wikipedia, wiki, book, books, library,

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