Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings. The process can be qualified based on the vapor source; physical vapor deposition uses a liquid or solid source and chemical vapor deposition uses a chemical vapor.[2]
In reactive deposition, the depositing material reacts either with a component of the gaseous environment (Ti + N → TiN) or with a co-depositing species (Ti + C → TiC). A plasma environment aids in activating gaseous species (N2 → 2N) and in decomposition of chemical vapor precursors (SiH4 → Si + 4H). The plasma may also be used to provide ions for vaporization by sputtering or for bombardment of the substrate for sputter cleaning and for bombardment of the depositing material to densify the structure and tailor properties (ion plating).
Typesedit
When the vapor source is a liquid or solid the process is called physical vapor deposition (PVD). When the source is a chemical vapor precursor, the process is called chemical vapor deposition (CVD). The latter has several variants: low-pressure chemical vapor deposition (LPCVD), plasma-enhanced chemical vapor deposition (PECVD), and plasma-assisted CVD (PACVD). Often a combination of PVD and CVD processes are used in the same or connected processing chambers.
^"Daily events and images of the installation of the BBSO New Solar Telescope". Big Bear Solar Observatory. Retrieved 6 January 2020.
^Quintino, Luisa (2014). "Overview of coating technologies". Surface Modification by Solid State Processing. pp. 1–24. doi:10.1533/9780857094698.1. ISBN9780857094681.
Bibliographyedit
SVC, "51st Annual Technical Conference Proceedings" (2008) SVC Publications ISSN 0737-5921 (previous proceeding available on CD)
Anders, Andre (editor) "Handbook of Plasma Immersion Ion Implantation and Deposition" (2000) Wiley-Interscience ISBN0-471-24698-0
Bach, Hans and Dieter Krause (editors) "Thin Films on Glass" (2003) Springer-Verlag ISBN3-540-58597-4
Bunshah, Roitan F (editor). "Handbook of Deposition Technologies for Films and Coatings", second edition (1994)
Glaser, Hans Joachim "Large Area Glass Coating" (2000) Von Ardenne Anlagentechnik GmbH ISBN3-00-004953-3
Glocker and I. Shah (editors), "Handbook of Thin Film Process Technology", Vol.1&2 (2002) Institute of Physics ISBN0-7503-0833-8 (2 vol. set)
Mahan, John E. "Physical Vapor Deposition of Thin Films" (2000) John Wiley & Sons ISBN0-471-33001-9
Mattox, Donald M. "Handbook of Physical Vapor Deposition (PVD) Processing" 2nd edition (2010) Elsevier ISBN978-0-8155-2037-5
Mattox, Donald M. "The Foundations of Vacuum Coating Technology" (2003) Noyes Publications ISBN0-8155-1495-6
Mattox, Donald M. and Vivivenne Harwood Mattox (editors) "50 Years of Vacuum Coating Technology and the Growth of the Society of Vacuum Coaters" (2007), Society of Vacuum Coaters ISBN978-1-878068-27-9
Westwood, William D. "Sputter Deposition", AVS Education Committee Book Series, Vol. 2 (2003) AVS ISBN0-7354-0105-5
Willey, Ronald R. "Practical Monitoring and Control of Optical Thin Films (2007)" Willey Optical, Consultants ISBN978-0-615-13760-5
Willey, Ronald R. "Practical Equipment, Materials, and Processes for Optical Thin Films" (2007) Willey Optical, Consultants ISBN978-0-615-14397-2
January 01, 1970
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This article includes a list of references related reading or external links but its sources remain unclear because it lacks inline citations Please help improve this article by introducing more precise citations April 2009 Learn how and when to remove this message Vacuum deposition is a group of processes used to deposit layers of material atom by atom or molecule by molecule on a solid surface These processes operate at pressures well below atmospheric pressure i e vacuum The deposited layers can range from a thickness of one atom up to millimeters forming freestanding structures Multiple layers of different materials can be used for example to form optical coatings The process can be qualified based on the vapor source physical vapor deposition uses a liquid or solid source and chemical vapor deposition uses a chemical vapor 2 Aluminising vacuum chamber at Mont Megantic Observatory used for re coating telescope mirrors 1 Contents 1 Description 2 Types 3 Applications 4 See also 5 References 6 BibliographyDescription editThe vacuum environment may serve one or more purposes reducing the particle density so that the mean free path for collision is long reducing the particle density of undesirable atoms and molecules contaminants providing a low pressure plasma environment providing a means for controlling gas and vapor composition providing a means for mass flow control into the processing chamber Condensing particles can be generated in various ways thermal evaporation sputtering cathodic arc vaporization laser ablation decomposition of a chemical vapor precursor chemical vapor deposition In reactive deposition the depositing material reacts either with a component of the gaseous environment Ti N TiN or with a co depositing species Ti C TiC A plasma environment aids in activating gaseous species N2 2N and in decomposition of chemical vapor precursors SiH4 Si 4H The plasma may also be used to provide ions for vaporization by sputtering or for bombardment of the substrate for sputter cleaning and for bombardment of the depositing material to densify the structure and tailor properties ion plating Types editWhen the vapor source is a liquid or solid the process is called physical vapor deposition PVD When the source is a chemical vapor precursor the process is called chemical vapor deposition CVD The latter has several variants low pressure chemical vapor deposition LPCVD plasma enhanced chemical vapor deposition PECVD and plasma assisted CVD PACVD Often a combination of PVD and CVD processes are used in the same or connected processing chambers Applications editElectrical conduction metallic films resistors transparent conductive oxides TCOs superconducting films amp coatings Semiconductor devices semiconductor films electrically insulating films Solar cells Optical films anti reflective coatings optical filters Reflective coatings mirrors hot mirrors Tribological coating hard coatings erosion resistant coatings solid film lubricants Energy conservation amp generation low emissivity glass coatings solar absorbing coatings mirrors solar thin film photovoltaic cells smart films Magnetic films magnetic recording Diffusion barrier gas permeation barriers vapor permeation barriers solid state diffusion barriers Corrosion protection Automotive applications lamp reflectors and trim applications Vinyl record pressing manufacture of gold and platinum records A thickness of less than one micrometre is generally called a thin film while a thickness greater than one micrometre is called a coating See also editIon plating Sputter deposition Cathodic arc deposition Spin coating Metallised film Molecular vapor depositionReferences edit Daily events and images of the installation of the BBSO New Solar Telescope Big Bear Solar Observatory Retrieved 6 January 2020 Quintino Luisa 2014 Overview of coating technologies Surface Modification by Solid State Processing pp 1 24 doi 10 1533 9780857094698 1 ISBN 9780857094681 Bibliography editSVC 51st Annual Technical Conference Proceedings 2008 SVC Publications ISSN 0737 5921 previous proceeding available on CD Anders Andre editor Handbook of Plasma Immersion Ion Implantation and Deposition 2000 Wiley Interscience ISBN 0 471 24698 0 Bach Hans and Dieter Krause editors Thin Films on Glass 2003 Springer Verlag ISBN 3 540 58597 4 Bunshah Roitan F editor Handbook of Deposition Technologies for Films and Coatings second edition 1994 Glaser Hans Joachim Large Area Glass Coating 2000 Von Ardenne Anlagentechnik GmbH ISBN 3 00 004953 3 Glocker and I Shah editors Handbook of Thin Film Process Technology Vol 1 amp 2 2002 Institute of Physics ISBN 0 7503 0833 8 2 vol set Mahan John E Physical Vapor Deposition of Thin Films 2000 John Wiley amp Sons ISBN 0 471 33001 9 Mattox Donald M Handbook of Physical Vapor Deposition PVD Processing 2nd edition 2010 Elsevier ISBN 978 0 8155 2037 5 Mattox Donald M The Foundations of Vacuum Coating Technology 2003 Noyes Publications ISBN 0 8155 1495 6 Mattox Donald M and Vivivenne Harwood Mattox editors 50 Years of Vacuum Coating Technology and the Growth of the Society of Vacuum Coaters 2007 Society of Vacuum Coaters ISBN 978 1 878068 27 9 Westwood William D Sputter Deposition AVS Education Committee Book Series Vol 2 2003 AVS ISBN 0 7354 0105 5 Willey Ronald R Practical Monitoring and Control of Optical Thin Films 2007 Willey Optical Consultants ISBN 978 0 615 13760 5 Willey Ronald R Practical Equipment Materials and Processes for Optical Thin Films 2007 Willey Optical Consultants ISBN 978 0 615 14397 2 Retrieved from https en wikipedia org w index php title Vacuum deposition amp oldid 1186979742, wikipedia, wiki, book, books, library,
