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Diffused junction transistor

A diffused junction transistor is a transistor formed by diffusing dopants into a semiconductor substrate. The diffusion process was developed later than the alloy-junction and grown junction processes for making bipolar junction transistors (BJTs).

Bell Labs developed the first prototype diffused junction bipolar transistors in 1954.[1]

Diffused-base transistor edit

The earliest diffused junction transistors were diffused-base transistors. These transistors still had alloy emitters and sometimes alloy collectors like the earlier alloy-junction transistors. Only the base was diffused into the substrate. Sometimes the substrate formed the collector, but in transistors like Philco's micro-alloy diffused transistors the substrate was the bulk of the base.

Double diffusion edit

At Bell Labs Calvin Souther Fuller produced basic physical understanding of a means of directly forming the emitter, base, and collector by double diffusion. The method was summarized in a history of science at Bell:[2]

"Fuller had shown that acceptors of low atomic weight diffuse more rapidly than donors, which made possible n–p–n structures by simultaneous diffusion of donors and acceptors of appropriately different surface concentrations. The first n layer (the emitter) was formed because of the greater surface concentration of the donor (for example, antimony). The base formed beyond it because of the more rapid diffusion of the acceptor (for example, aluminum). The inner (collector) boundary of the base appeared where the diffused aluminum no longer over-compensated the n-type background doping of the original silicon. The base layers of the resulting transistors were 4 μm thick. ... Resulting transistors had a cut-off frequency of 120 MHz."

Mesa transistor edit

 
Comparison of the mesa (left) and planar (Hoerni, right) technologies. Dimensions are shown schematically.

Texas Instruments made the first grown-junction silicon transistors in 1954.[3] The diffused silicon mesa transistor was developed at Bell Labs in 1955 and made commercially available by Fairchild Semiconductor in 1958.[4]

These transistors were the first to have both diffused bases and diffused emitters. Unfortunately, like all earlier transistors, the edge of the collector–base junction was exposed, making it sensitive to leakage through surface contamination, thus requiring hermetic seals or passivation to prevent degradation of the transistor's characteristics over time.[5]

Planar transistor edit

 
Simplified cross section of a planar npn bipolar junction transistor

The planar transistor was developed by Dr. Jean Hoerni[6] at Fairchild Semiconductor in 1959. The planar process used to make these transistors made mass-produced monolithic integrated circuits possible.

Planar transistors have a silica passivation layer to protect the junction edges from contamination, making inexpensive plastic packaging possible without risking degradation of the transistor's characteristics over time.

The first planar transistors had a switching speed much lower than alloy junction transistors of the period, but as they could be mass-produced, and alloy junction transistors could not, they cost much less, and the characteristics of planar transistors improved very rapidly, quickly exceeding those of all earlier transistors and making earlier transistors obsolete.

References edit

  1. ^ Bell Labs Prototype Diffused Base Triode, Transistor Museum, Historic Transistor Photo Gallery.
  2. ^ S. Millman editor (1983) A History of Engineering and Science in the Bell System, volume 4: Physical Sciences, Bell Labs ISBN 0-932764-03-7 p. 426
  3. ^ Lécuyer, Christophe; Brock, David C. (2010). Makers of the Microchip: A Documentary History of Fairchild Semiconductor. MIT Press. ISBN 9780262014243., p. 11.
  4. ^ Lécuyer & Brock 2010, pp. 10–22
  5. ^ Riordan, Michael (December 2007). "The Silicon Dioxide Solution: How physicist Jean Hoerni built the bridge from the transistor to the integrated circuit". IEEE Spectrum. IEEE. Retrieved November 28, 2012.
  6. ^ Fairchild 2N1613, Transistor Museum, Historic Transistor Photo Gallery.
  • F.M. Smits editor (1985) A History of Engineering and Science in the Bell System, volume 6: Electronics Technology, pp 43–57, Bell Labs, ISBN 0-932764-07-X .

diffused, junction, transistor, this, article, needs, additional, citations, verification, please, help, improve, this, article, adding, citations, reliable, sources, unsourced, material, challenged, removed, find, sources, news, newspapers, books, scholar, js. This article needs additional citations for verification Please help improve this article by adding citations to reliable sources Unsourced material may be challenged and removed Find sources Diffused junction transistor news newspapers books scholar JSTOR February 2011 Learn how and when to remove this message A diffused junction transistor is a transistor formed by diffusing dopants into a semiconductor substrate The diffusion process was developed later than the alloy junction and grown junction processes for making bipolar junction transistors BJTs Bell Labs developed the first prototype diffused junction bipolar transistors in 1954 1 Contents 1 Diffused base transistor 2 Double diffusion 3 Mesa transistor 4 Planar transistor 5 ReferencesDiffused base transistor editThe earliest diffused junction transistors were diffused base transistors These transistors still had alloy emitters and sometimes alloy collectors like the earlier alloy junction transistors Only the base was diffused into the substrate Sometimes the substrate formed the collector but in transistors like Philco s micro alloy diffused transistors the substrate was the bulk of the base Double diffusion editAt Bell Labs Calvin Souther Fuller produced basic physical understanding of a means of directly forming the emitter base and collector by double diffusion The method was summarized in a history of science at Bell 2 Fuller had shown that acceptors of low atomic weight diffuse more rapidly than donors which made possible n p n structures by simultaneous diffusion of donors and acceptors of appropriately different surface concentrations The first n layer the emitter was formed because of the greater surface concentration of the donor for example antimony The base formed beyond it because of the more rapid diffusion of the acceptor for example aluminum The inner collector boundary of the base appeared where the diffused aluminum no longer over compensated the n type background doping of the original silicon The base layers of the resulting transistors were 4 mm thick Resulting transistors had a cut off frequency of 120 MHz Mesa transistor edit nbsp Comparison of the mesa left and planar Hoerni right technologies Dimensions are shown schematically Texas Instruments made the first grown junction silicon transistors in 1954 3 The diffused silicon mesa transistor was developed at Bell Labs in 1955 and made commercially available by Fairchild Semiconductor in 1958 4 These transistors were the first to have both diffused bases and diffused emitters Unfortunately like all earlier transistors the edge of the collector base junction was exposed making it sensitive to leakage through surface contamination thus requiring hermetic seals or passivation to prevent degradation of the transistor s characteristics over time 5 Planar transistor edit nbsp Simplified cross section of a planar npn bipolar junction transistor The planar transistor was developed by Dr Jean Hoerni 6 at Fairchild Semiconductor in 1959 The planar process used to make these transistors made mass produced monolithic integrated circuits possible Planar transistors have a silica passivation layer to protect the junction edges from contamination making inexpensive plastic packaging possible without risking degradation of the transistor s characteristics over time The first planar transistors had a switching speed much lower than alloy junction transistors of the period but as they could be mass produced and alloy junction transistors could not they cost much less and the characteristics of planar transistors improved very rapidly quickly exceeding those of all earlier transistors and making earlier transistors obsolete References edit Bell Labs Prototype Diffused Base Triode Transistor Museum Historic Transistor Photo Gallery S Millman editor 1983 A History of Engineering and Science in the Bell System volume 4 Physical Sciences Bell Labs ISBN 0 932764 03 7 p 426 Lecuyer Christophe Brock David C 2010 Makers of the Microchip A Documentary History of Fairchild Semiconductor MIT Press ISBN 9780262014243 p 11 Lecuyer amp Brock 2010 pp 10 22 Riordan Michael December 2007 The Silicon Dioxide Solution How physicist Jean Hoerni built the bridge from the transistor to the integrated circuit IEEE Spectrum IEEE Retrieved November 28 2012 Fairchild 2N1613 Transistor Museum Historic Transistor Photo Gallery F M Smits editor 1985 A History of Engineering and Science in the Bell System volume 6 Electronics Technology pp 43 57 Bell Labs ISBN 0 932764 07 X Retrieved from https en wikipedia org w index php title Diffused junction transistor amp oldid 1193665822 Planar transistor, wikipedia, wiki, book, books, library,

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