Magnetolithography (ML) is a photoresist-less and photomaskless lithography method for patterning wafer surfaces. ML based on applying a magnetic field on the substrate using paramagnetic metal masks named "magnetic mask" placed on either topside or backside of the wafer.[1][2] Magnetic masks are analogous to a photomask in photolithography, in that they define the spatial distribution and shape of the applied magnetic field.[2] The fabrication of the magnetic masks involves the use of conventional photolithography and photoresist however.[2] The second component of the process is ferromagnetic nanoparticles (analogous to the photoresist in photolithography, e.g. cobalt nanoparticles) that are assembled over the substrate according to the field induced by the mask which blocks its areas from reach of etchants or depositing materials (e.g. dopants or metallic layers).[1][2]
ML can be used for applying either a positive or negative approach. In the positive approach, the magnetic nanoparticles react chemically or interact via chemical recognition with the substrate. Hence, the magnetic nanoparticles are immobilized at selected locations, where the mask induces a magnetic field, resulting in a patterned substrate. In the negative approach, the magnetic nanoparticles are inert to the substrate. Hence, once they pattern the substrate, they block their binding site on the substrate from reacting with another reacting agent. After the adsorption of the reacting agent, the nanoparticles are removed, resulting in a negatively patterned substrate.
ML is also a backside lithography, which has the advantage of ease in producing multilayer with high accuracy of alignment and with the same efficiency for all layers.
Referencesedit
^ ab"Magnetolithography: From the Bottom-Up Route to High Throughput". Advances in Imaging and Electron Physics. 164: 1–27. 2010-01-01. doi:10.1016/B978-0-12-381312-1.00001-8. ISSN 1076-5670.
^ abcdedited by Peter W. Hawkes (2010). Advances in imaging and electron physics. Volume 164. Amsterdam: Academic Press. ISBN978-0-12-381313-8. OCLC 704352532. {{cite book}}: |last= has generic name (help)
Bardea, Amos; Burshtein, Noa; Rudich, Yinon; Salame, Tomer; Ziv, Carmit; Yarden, Oded; Naaman, Ron (2011-12-15). "Sensitive Detection and Identification of DNA and RNA Using a Patterned Capillary Tube". Analytical Chemistry. 83 (24). American Chemical Society (ACS): 9418–9423. doi:10.1021/ac202480w. ISSN 0003-2700. PMID 22039991.
Bardea, Amos; Naaman, Ron (2010). "Magnetolithography". Advances in Imaging and Electron Physics. Vol. 164. Elsevier. pp. 1–27. doi:10.1016/b978-0-12-381312-1.00001-8. ISBN978-0-12-381312-1. ISSN 1076-5670.
Kumar, Tatikonda Anand; Bardea, Amos; Shai, Yechiel; Yoffe, Alexander; Naaman, Ron (2010-06-09). "Patterning Gradient Properties from Sub-Micrometers to Millimeters by Magnetolithography". Nano Letters. 10 (6). American Chemical Society (ACS): 2262–2267. Bibcode:2010NanoL..10.2262K. doi:10.1021/nl1013635. ISSN 1530-6984. PMID 20491500.
Bardea, Amos; Baram, Aviad; Tatikonda, Anand Kumar; Naaman, Ron (2009-12-30). "Magnetolithographic Patterning of Inner Walls of a Tube: A New Dimension in Microfluidics and Sequential Microreactors". Journal of the American Chemical Society. 131 (51). American Chemical Society (ACS): 18260–18262. doi:10.1021/ja908675c. ISSN 0002-7863. PMID 19961172.
Bardea, Amos; Naaman, Ron (2009-05-19). "Submicrometer Chemical Patterning with High Throughput Using Magnetolithography". Langmuir. 25 (10). American Chemical Society (ACS): 5451–5454. doi:10.1021/la900601w. ISSN 0743-7463. PMID 19382781.
Bardea, Amos; Naaman, Ron (2009-02-06). "Magnetolithography: From Bottom-Up Route to High Throughput". Small. 5 (3). Wiley: 316–319. doi:10.1002/smll.200801058. ISSN 1613-6810. PMID 19123174.
January 01, 1970
magnetolithography, photoresist, less, photomaskless, lithography, method, patterning, wafer, surfaces, based, applying, magnetic, field, substrate, using, paramagnetic, metal, masks, named, magnetic, mask, placed, either, topside, backside, wafer, magnetic, m. Magnetolithography ML is a photoresist less and photomaskless lithography method for patterning wafer surfaces ML based on applying a magnetic field on the substrate using paramagnetic metal masks named magnetic mask placed on either topside or backside of the wafer 1 2 Magnetic masks are analogous to a photomask in photolithography in that they define the spatial distribution and shape of the applied magnetic field 2 The fabrication of the magnetic masks involves the use of conventional photolithography and photoresist however 2 The second component of the process is ferromagnetic nanoparticles analogous to the photoresist in photolithography e g cobalt nanoparticles that are assembled over the substrate according to the field induced by the mask which blocks its areas from reach of etchants or depositing materials e g dopants or metallic layers 1 2 ML can be used for applying either a positive or negative approach In the positive approach the magnetic nanoparticles react chemically or interact via chemical recognition with the substrate Hence the magnetic nanoparticles are immobilized at selected locations where the mask induces a magnetic field resulting in a patterned substrate In the negative approach the magnetic nanoparticles are inert to the substrate Hence once they pattern the substrate they block their binding site on the substrate from reacting with another reacting agent After the adsorption of the reacting agent the nanoparticles are removed resulting in a negatively patterned substrate ML is also a backside lithography which has the advantage of ease in producing multilayer with high accuracy of alignment and with the same efficiency for all layers References edit a b Magnetolithography From the Bottom Up Route to High Throughput Advances in Imaging and Electron Physics 164 1 27 2010 01 01 doi 10 1016 B978 0 12 381312 1 00001 8 ISSN 1076 5670 a b c d edited by Peter W Hawkes 2010 Advances in imaging and electron physics Volume 164 Amsterdam Academic Press ISBN 978 0 12 381313 8 OCLC 704352532 a href Template Cite book html title Template Cite book cite book a last has generic name help Bardea Amos Burshtein Noa Rudich Yinon Salame Tomer Ziv Carmit Yarden Oded Naaman Ron 2011 12 15 Sensitive Detection and Identification of DNA and RNA Using a Patterned Capillary Tube Analytical Chemistry 83 24 American Chemical Society ACS 9418 9423 doi 10 1021 ac202480w ISSN 0003 2700 PMID 22039991 Bardea Amos Naaman Ron 2010 Magnetolithography Advances in Imaging and Electron Physics Vol 164 Elsevier pp 1 27 doi 10 1016 b978 0 12 381312 1 00001 8 ISBN 978 0 12 381312 1 ISSN 1076 5670 Kumar Tatikonda Anand Bardea Amos Shai Yechiel Yoffe Alexander Naaman Ron 2010 06 09 Patterning Gradient Properties from Sub Micrometers to Millimeters by Magnetolithography Nano Letters 10 6 American Chemical Society ACS 2262 2267 Bibcode 2010NanoL 10 2262K doi 10 1021 nl1013635 ISSN 1530 6984 PMID 20491500 Bardea Amos Baram Aviad Tatikonda Anand Kumar Naaman Ron 2009 12 30 Magnetolithographic Patterning of Inner Walls of a Tube A New Dimension in Microfluidics and Sequential Microreactors Journal of the American Chemical Society 131 51 American Chemical Society ACS 18260 18262 doi 10 1021 ja908675c ISSN 0002 7863 PMID 19961172 Bardea Amos Naaman Ron 2009 05 19 Submicrometer Chemical Patterning with High Throughput Using Magnetolithography Langmuir 25 10 American Chemical Society ACS 5451 5454 doi 10 1021 la900601w ISSN 0743 7463 PMID 19382781 Bardea Amos Naaman Ron 2009 02 06 Magnetolithography From Bottom Up Route to High Throughput Small 5 3 Wiley 316 319 doi 10 1002 smll 200801058 ISSN 1613 6810 PMID 19123174 Retrieved from https en wikipedia org w index php title Magnetolithography amp oldid 1188209311, wikipedia, wiki, book, books, library,
